Chemical mechanism and deposition scheme of the MAGRITTEv1.1 model

The page provides information related to the chemical mechanism (organic compounds) and deposition scheme of the MAGRITTE v1.1 model. More specifically:
1. the chemical mechanism in KPP format,
2. absorption cross sections for the photolysis of specific classes of organic compounds,
3. fortran code for the calculation of resistances to the deposition of chemical compounds,
4. dry deposition velocity measurements used for evaluation of the model

Data and Resources

Tags and groups

Cite this as (APA format)

Müller, J.-F., & Stavrakou, T. (2018). Chemical mechanism and deposition scheme of the MAGRITTEv1.1 model (Version 1.1). Royal Belgian Institute for Space Aeronomy. https://doi.org/10.18758/71021042
Retrieved: 15:11 13 Jul 2024 (UTC)
Users of this data are kindly encouraged to contact the author(s) for help and cooperation towards further successful data utilisation.

Author(s)

Principal

Müller, Jean-Françoisorcid, Royal Belgian Institute for Space Aeronomy

Other(s)

Stavrakou, Trisevgeni, Royal Belgian Institute for Space Aeronomy;

Maintainer data-contact of Royal Belgian Institute for Space Aeronomy

Technical info

Source resource from which it is derivated /
Is referenced by
Documentation https://tropo.aeronomie.be/index.php/models/magritte
Other structured data /

Temporal features

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Spatial features

No information about resolution


Additional info

Funding details /
Repository homepage https://data.aeronomie.be/dataset/
Conforms to /
Last Updated July 1, 2024, 09:32 (UTC)
Created April 25, 2018, 00:00 (UTC)